Any of the following gases may be employed as the supplemental gas: water vapor, ozone, hydrogen, nitrogen, nitrogen oxides, or a halogenide such as tetrafluoromethane, chlorine, nitrogen trifluoride, hexafluoroethane, or methyltrifluoride.
Disclosed herein are a process for the refinement of nitrogen trifluoride gas and an adsorbent therefor.
Disclosed herein are a process for the refinement of nitrogen trifluoride gas and an adsorbent used therein.
The fluorine ions my, by way of example, be sourced from fluorine, silicon tetrafluoride or nitrogen trifluoride.
The absorption and subsequent desorption are repeated by compressing the nitrogen trifluoride prior to absorption.
The boron trifluoride complex catalyst according to the present invention comprises a boron trifluoride, and at least two different species of alcohol compounds with 1 to 10 carbon atoms.
A process for controlling the regeneration of boron trifluoride catalyst complexes in the production of carboxylic acids and other products using boron trifluoride hydrates as a catalyst.
This invention further provides such a process with excellent recovery of the boron trifluoride.
The subject matter also concerns a method of producing gaseous boron trifluoride.
The boron trifluoride gas is then mixed in the chamber with an oxygen-containing gas (20) to produce a boron trifluoride-containing gas mixture, which is transferred to an enclosed vessel (40) containing the molten metal.
Methods of cleaning a processing chamber with nitrogen trifluoride (NF3) are described.
Furthermore, nitrogen trifluoride (NF3) was added to the basket of the six Kyoto Protocol gases.
The main criterion for an absorbent selection is the inertness thereof to the nitrogen trifluoride.
In the combustion chamber, ethylene is burned in nitrogen trifluoride.
Two said methods make it possible to bring the absorbent vapour content in the nitrogen trifluoride up to trace amounts.
d.3 does not apply to nitrogen trifluoride (CAS 7783-54-2) in its gaseous state.
Note 2ML8.d.3 does not control nitrogen trifluoride in its gaseous state.
ML8.d.3 does not apply to nitrogen trifluoride (CAS 7783-54-2) in its gaseous state.
d.3 does not apply to nitrogen trifluoride (CAS 7783-54-2) in its gaseous state.
ML8.d.3 does not apply to nitrogen trifluoride (CAS 7783-54-2) in its gaseous state.
For example, the boron trifluoride molecule (BF3) has a trigonal planar arrangement of three polar bonds at 120°.
For example, boron trifluoride (BF3) has a trigonal planar arrangement of three polar bonds at 120°.
The oligomerization may be carried out with or without a medium, at a temperature above 0 °C, by adjusting the pressure to 1-10 bar by means of BF3 gas.
For example, the boron trifluoride molecule {BF3) has a trigonal planar arrangement of three polar bonds at 120°.
Said method consists in polymerising an isobutene or hydrocarbon mixture containing isobutene in the liquid phase in the presence of a boron trifluoride complex catalyst of composition (BF3)a .
Reacts violently with bromine trifluoride, sodium and nitrates
An apparatus and method for gas-phase bromine trifluoride (BrF3) silicon isotropic room temperature etching system for both bulk and surface micromachining.
The process requires a source of fluorine gas or chlorine trifluoride.
Note 1ML8.d.3 does not control chlorine trifluoride.
Chlorine trifluoride is an interhalogen compound with the formula ClF3.
d.3 does not apply to chlorine trifluoride (CAS 7790-91-2).
d.3 does not apply to chlorine trifluoride (CAS 7790-91-2).
Nitrogen trifluoride (NF3) containing less than 10 parts-per-million molar impurities, e.g., tetrafluoromethane (PFC-14), is disclosed.
Apparatus is disclosed for the production of nitrogen trifluoride (NF3), starting with an anhydrous molten flux including ammonia (NH3), a metal fluoride (MF), and hydrogen fluoride (HF).
Item 4.C.4.a.6. does not control Nitrogen Trifluoride (NF3) (CAS 7783-54-2) in a gaseous state as it is not usable for missile applications.
A fluorination catalyst such as a chromium oxide-based fluorination catalyst may be activated or reactivated by contacting the catalyst. with a source of reactive fluorine, for example nitrogen trifluoride (NF3) or fluorine (F2).
Note: Item 4.C.4.a.6. does not control Nitrogen Trifluoride (NF3) (CAS 7783-54- 2) in a gaseous state as it is not usable for missile applications.
Chlorine trifluoride is the chemical compound with the formula ClF3.
Large interhalogens, such as ClF3 can be produced by a reaction of a pure halogen with a smaller interhalogen such as ClF.
It is possible to produce larger interhalogens, such as ClF3, by exposing smaller interhalogens, such as ClF, to pure diatomic halogens, such as F2.
Also, new methods for producing trifluoromethyl-containing compounds with phenylsulfur trifluoride or primary alkyl-substituted phenylsulfur trifluoride are also disclosed.
New methods for producing difluoromethylene-containing compounds with phenylsulfur trifluoride or a primary alkyl-substituted phenylsulfur trifluoride are disclosed.
A process and composition for removing moisture from a NF3 or F2 gas wherein the gas is contacted with alumina particles coated with aluminum trifluoride.
The present invention relates to a process for the production of boron trifluorine complexes.
The moist neodymium trifluoride (NdF3) produced by both schemes can be dried by using the same microwave radiation technique to produce dry neodymium trifluoride (NdF3) which contains less than 3 % moisture.
The trifluoride of uranium was characterised by J. Laveissiere.
The trifluoride of uranium was characterised by J. Laveissiere.[13]
An initial substitution of the fluorine atom in a benzene ring of said polyfluoride benzo-trifluoride by an amine group is carried out upon the action of an aminating agent in such a way that a fluorine-containing amino benzo-trifluoride is obtained.
An etching gas comprising nitrogen tri-fluoride, ammonia and hydrogen is energized in a remote chamber.
5 Nitrogen trifluoride, which has the molecular formula NF3 17,200
The methods involve a concurrent introduction of nitrogen trifluroide and a reactive diluent into the chamber.
The aluminum trifluoride is formed by reacting alumina particles with an aqueous solution of hydrogen fluoride.
Nitrogen trifluoride (NF3) must be additionally included since 2015.
The trifluoride of uranium was characterised by J. Laveissiere.[13]
Concentrations of nitrogen triflouride in the atmosphere are rising 11% per year.
Requêtes fréquentes français :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k,
Requêtes fréquentes anglais :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k,
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