The spent decontamination solution may be recycled in the decontamination process after regeneration.
The invention relates to a method for removing nitrate ions from a solution, said solution being especially a used decontamination solution or any other given used solution utilized for decreasing radioactivity of a metal part.
The decontamination solution flows into the central compartment (109) and the radioactive cations in the solution are drawn towards the cathode (133).
To this end, an oxide layer is firstly removed from the metal part by using a decontamination solution.
A capacitor is exposed to the decontamination solution, wherein the decontamination solution acts as the dielectric between the plates of the capacitor.
The inventive detoxification solution can additionally contain 1 H-benzotriazol as an anticorrosive agent and is suitable especially for decontaminating surfaces contaminated with chemical and/or biological warfare agents.
CLEANTECH99 is specialised in decontamination, bio-decontamination and high-level disinfection solutions for clean rooms and related controlled atmosphere environments.
CLEANTECH99 is specialised in decontamination, bio-decontamination and high-level disinfection solutions for clean rooms and related controlled atmosphere environments.
A mixing chamber assembly (80) selectively dispenses detergent concentrate and decontaminant concentrate into a liquid to form a liquid cleaning solution or a liquid decontaminant solution, respectively.
Mr Keshe wrote the paper, “Keshe Foundation Contribution to Fukushima Decontamination Solution”.
MT Keshe wrote the paper, "Keshe Foundation Contribution to Fukushima Decontamination Solution".
Mr Keshe wrote the paper, “Keshe Foundation Contribution to Fukushima Decontamination Solution”.
MT Keshe wrote the paper, "Keshe Foundation Contribution to Fukushima Decontamination Solution".
Mr Keshe wrote the paper, "Keshe Foundation Contribution to Fukushima Decontamination Solution".
The properties of materials exposed to a decontamination solution are almost identical property values of the control sample not exposed.
Requêtes fréquentes français :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k,
Requêtes fréquentes anglais :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k,
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