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sciences naturelles et appliquées - iate.europa.eu
Synthesis and property of tannic acid derivatives and their application for extreme ultraviolet laser lithography system... However, only TA-BVE97 and TA-AD74 can be used as positive-type photo-resist materials using 2.38...
sciences naturelles et appliquées - core.ac.uk - PDF: kansai-u.repo.nii.ac.jp
sciences naturelles et appliquées - iate.europa.eu

Publications scientifiques

Nanoimprint resist material containing ultraviolet reactive fluorine surfactant for defect reduction in lithographic fabrication... This procedure is proven to be suitable for advanced resist material design under the process conditions....
général - core.ac.uk - PDF: doaj.org
Inedible cellulose-based biomass resist material amenable to water-based processing for use in electron beam lithographyAn electron beam (EB) lithography method using inedible cellulose-based resist material derived from woody biomass has been successfully developed....
général - core.ac.uk - PDF: doaj.org
High temperature metallic diffraction gratings and process of manufacturing same... The method includes coating the surface of the substrate with an uniform layer of metal which is then overlaid with a layer of photo-resist material....
général - core.ac.uk - PDF: digital.library.unt.edu
Synthesis and property of tellurium-containing polymer for extreme ultraviolet resist material...physical properties, and resist properties of tellurium containing polymer with pendant adamantyl ester groups poly(Re-co-Te)-AD were examined, relevant to the application of resist material for extreme ultraviolet laser photolithography (EUVL) system....
général - core.ac.uk - PDF: kansai-u.repo.nii.ac.jp

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