Next, nanocarbon is affixed to the surface of the first resist pattern (102a), then a second resist film (105) is formed on the substrate (101) including the first resist pattern (102a).

The second resist film (105) is developed to form the second resist pattern (105a) from the second resist film (105).

Then the first resist film (102) is developed to form a first resist pattern (102a) from the first resist film (102).

A template (3) manufactured to have high-accuracy protrusions and recesses in advance by a lithography technology employing an electron beam is pressed against a resist film (2) applied onto a substrate (1) thus transferring a resist pattern (5).

Module 5: FGM as Grounds for International Protection

increased use of detention on grounds of protection of public order

On the at least one surface of the substrate (41), at least part of the portion of the substrate where the wiring pattern (43) is not formed is not covered by the wiring protection pattern (46a).

The protection pattern is disposed between the repair wire and the electric connection wire which the repair wire crosses.

Canada should include statelessness as a ground for protection, under the Immigration and Refugee Protection Act.

A thin metal film (6) for electrode is then formed on the resist pattern (5) formed by transfer and then it is stripped off by a lift-off method along with the resist film (2).

Many Acts include exposure to family violence as a ground for protection.

Many Acts include exposure to family violence as a ground for protection.