A photolithography mask including a plurality of mask features.
A photolithography mask design in simplified.
The invention relates to extreme-ultraviolet photolithography masks.
In one example, a target mask design is optimized for a photolithography mask.
The invention relates to extreme-UV photolithography masks operating in reflection.
The construction process only requires one-step photolithography.
The next step is to fabricate a photolithographic mask.
Disclosed is a mask for photolithographic processes, comprising opaque and transparent zones and a surface structure.
Kenneth Goldberg is seen in the reflective coating of a photolithography mask, contained in the clear plastic box, which he’s about to measure at the Advanced Light Source’s beamline 11.3.2.
Requêtes fréquentes français :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k,
Requêtes fréquentes anglais :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k,
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