rockfill dam with concrete facing
Said optical arrangement comprises a region for expanding a light beam (13) upstream of the mask (4), and a region for converging the light (15) downstream of the mask (4).
A masking apparatus includes a mask positioned upstream of a target positioned for treatment with ions.
The upstream MCD receives an upstream optical signal from the ONUs, converts the upstream optical signal to an upstream electrical signal, and transmits a regenerated upstream optical signal to the OLTs.
The first mask is a phase shift mask and the second mask is a single phase structure mask.
The upstream part (7) bears an upstream piercing arrangement (34) for opening an upstream portion of such cartridge.
The mask may be an amplitude mask or phase mask.
The upstream layer may include an ePTFE layer laminated to the upstream side of the upstream layer.
The upstream surface extends upstream of the leading edge of the blades.
The mask can be an attenuating PSM or binary mask.
The first upstream node is the upstream node of the intermediate node.
The multi-layer shadow mask includes a sacrificial mask bonded to a deposition mask.
The mask comprises a flat mask plate.
A photolithography mask including a plurality of mask features.
The mask may include at least one of a random symbol mask, an amplitude mask and a phase mask.
Requêtes fréquentes français :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k,
Requêtes fréquentes anglais :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k,
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