An ultrashort excimer laser pulse is thereby generated without using an expensive mode lock laser.
Preferably an excimer laser system is used.
Also, a nozzle is preferably formed by ablation processing which uses excimer laser.
The invention relates to the control of the spatio-temporal uniformity of a pulsed gas laser beam, especially generated by a high-power excimer laser.
At least a portion of the coating has an excimer laser textured surface.
The electrical discharge laser can be a KrF or a ArF excimer laser, or a F2 molecular laser, which can be applied as a radiation exposure source for microlithography.
A photomask blank for use in producing a photomask for exposure with an ArF excimer laser.
The laser then is utilized to remove a portion of the tissue.
Disclosed are a single-cavity dual-electrode discharge cavity and an excimer laser using same.
In particular, the invention relates to an initial determination of a laser energy and the monitoring of the laser energy preferably of an excimer laser for use in a refractive laser system for treatment of any eye.
The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5mJ or greater.
A preferred embodiments is an ArF excimer laser specifically designed as a light source for integrated circuit lithography.
Conventionally, in order to fabricate the active matrix, a low-cost amorphous semiconductor is employed that needs to be recrystallized by an excimer laser.
The invention relates to medicine, in particular to opthalmology and is used for excimer laser myopia correction.
The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5mJ or greater.
A photomask blank for use in producing a photomask for exposure with an ArF excimer laser.
The optical device can be satisfactorily applied to the projection lens of an aligner whose light source is an excimer laser.
An apparatus, system, and method for an excimer laser having lasing gas and electron emitters emitting electrons upon the application of an emitting voltage is described herein.
An excimer laser with a laser chamber (2) containing a circulating laser gas containing fluorine and a set of long life electrode structures (83A and 84A).
Preferentially, the excimer laser structuring is carried out according to the mask projection technique and the picosecond or femtosecond laser (15) structuring according to the focus technique.
Requêtes fréquentes français :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k,
Requêtes fréquentes anglais :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k,
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