Tungsten hexafluoride with a purity of 99,9 % by weight or more
The tungsten deposition process may be done by CVD using tungsten hexafluoride and hydrogen.
Tungsten hexafluoride with a purity by weight of 99,9 % or more (CAS RN 7783-82-6
Tungsten hexafluoride with a purity of 99,9 % by weight or more (CAS RN 7783-82-6
The tungsten nitride deposition is performed by plasma enhanced chemical vapor deposition (PECVD) using a plasma containing hydrogen, nitrogen and tungsten hexafluoride.
In the second deposition stage there may be a greater quantity of tungsten-hexafluoride than silane.
Specifically, in the first deposition stage there is a greater quantity of silane gas than tungsten-hexafluoride gas.
Requêtes fréquentes français :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k,
Requêtes fréquentes anglais :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k,
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