The present invention is concerned with a process for fabricating a ridge waveguide, and an optical waveguide comprising this ridge waveguide.
The semiconductor layer includes a ridge waveguide and a heater strip extending parallel to the ridge waveguide.
The planarization layer (3) embeds the ridge waveguide (2b) such that a surface (21) of the ridge waveguide (2b) and a surface (22) of the planarization layer (3) form a flat main surface (4).
More specifically, the ridge waveguide is fabricated from an optical waveguide made of superposed cladding layer, core layer and, possibly, a buffer layer.
By modifying two laterally adjacent strips of the optical waveguide from the outer surface of the cladding layer, a ridge waveguide is formed between these two modified strips.
A hybrid waveguide structure is disclosed comprising a combination of buried waveguide sections and ridge waveguide sections on the same substrate, sharing a common core layer (2).
Requêtes fréquentes français :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k,
Requêtes fréquentes anglais :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k,
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