A device for forming an ion sheath in a plasma to deposit coatings on a non-conducting substrate (12).
The methods include placing the article to be treated within an ion sheath adjacent to an electrode and placing the article to be treated between powered and grounded electrodes separated by about 25 mm or less.
Requêtes fréquentes français :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k, -2000k,
Requêtes fréquentes anglais :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k, -2000k,
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