A radiation beam, for example a therapeutic radiation beam such as an IMRT or VMAT X-ray beam is monitored using a Monolithic Active Pixel Sensor (MAPS) detector.
The radiation source (26) supplies the first and second radiation beams.
The beam source generates the electromagnetic radiation beam.
The beam source generates the electromagnetic radiation beam.
A radiation source generates a radiation beam, and a beam splitter splits the radiation beam into a first detection path and a second detection path.
The birefringent part is capable of varying characteristics of a first radiation beam 3b and a second radiation beam 3c, the first and second radiation beams having different polarisations.
The radiation source may be adapted to emit a vertically diverging beam of radiation, such as a fan beam.
The optical splitting element is configured to generate at least a first beam of radiation and a second beam of radiation.
The optical scanning device comprises means (101) for generating a first radiation beam and a second radiation beam.
The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam.
The optical system being arranged to combine (360, 660, 740) the portion of the reflected radiation beam (311) with a reference radiation beam (361, 331) to generate a combined radiation beam.
A radiation system is configured to generate a radiation beam.
Each stack provides a beam of laser radiation.
The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam.
A radiation system is configured tp generate a radiation beam.
The at least one excitation irradiation beam may be a plurality of excitation irradiation beams.
A first chamber has a first axis and is configured to receive a beam of radiation and absorb a portion of the beam of radiation.
Aberration in the detected radiation beam is then measured.
The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam.
The method further includes modifying a characteristic of the radiation beam as the radiation beam is scanned.
The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam.
Requêtes fréquentes français :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k,
Requêtes fréquentes anglais :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k,
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