The invention relates to a contact for contacting a contact with a contact arrangement.

The first conductive contact is in electrical contact with the first material and the second conductive contact is in electrical contact with the third material.

with pantograph raised and touching the contact wire

with pantograph raised and touching the contact wire

with pantograph raised and touching the contact wire

The electrode is in contact with the contact region.

A calibration member (36) is engaged with the valve member and engaged with the spring.

The blades are in air-tight contact with the casing, as a piston is in contact with its cylinder.

the pantograph shall be in contact with 1 copper contact wire

The CMOS device further includes a gate in contact with a channel and in contact with an extension region.

the pantograph shall be in contact with 1 copper contact wire.

The first contact surface makes contact with the protrusion.

Each electrical conductor contacts a respective electrical contact.

The seal (110) has a ring contacting outer portion and a shaft contacting inner portion.

A first contact structure contacts the crystalline layer (14) and a second contact structure contacts the amorphous layer (15).