radial profile of plasma current
In the plasma source, a plasma current is generated in the plasma region.
A filtered cathodic-arc plasma source of lower plasma losses and higher output plasma current to input current efficiency is disclosed.
At least one current pulse is generated and causes a plasma current and a displacement current.
Said plasma is generated in a discharge space comprising a plurality of electrodes, by applying an alternating plasma energizing voltage to said electrodes causing a plasma current and a displacement current.
In one application, the plasma stream may be used to excite nanoparticles.
A RF (Radio Frequency) plasma power is applied to a plasma electrode of the reactor synchronised with the supply of at least one among the process gases.
The apparatus is provided with a unit (9) for recording the physical parameters of the plasma stream (2).
The invention relates to a system for generating a plasma stream which may be useful for various applications.
A method of control of a plasma stream formed by at least two plasma-forming gas, in which the gas jets are acted on by passing electric currents therethrough and superposing a magnetic field on each jet.
In an embodiment, a biocompatible carrier gas is ionized to form a biocompatible atmospheric plasma stream.
The flow of plasma and eluted platelets are directed to an outlet (46) for transport from the chamber.
In another application, the plasma stream may applications be used for sterilization and therapy in accordance with the teachings of the invention.
This provides a large-diameter stream of plasma of substantially uniform density flowing longitudinally throughout the magnetic field.
Thermal spray apparatus operate to develop a plasma stream for introduction to a nozzle, for eventual application to the surface of a substrate.
The easiest way to generate a poloidal field is with a plasma current.
To make an improved ceramic faced metal article, fibers (24) are sprayed onto the workpiece (20, 34) by injecting fibers (44) into the plasma stream (36) external to the plasma gun nozzle (38).
A method in a high density plasma chamber for protecting a semiconductor substrate from charging damage from plasma-induced current through the substrate while etching through a selected portion of a conductive layer above the substrate.
Requêtes fréquentes français :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k,
Requêtes fréquentes anglais :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k,
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