The slip cast part can be made of slip cast silicon carbide coated with CVD silicon carbide.

A plasma processing chamber including a slip cast part having a surface thereof exposed to the interior space of the chamber.

The method of the invention is based especially on the combination of freeze-casting and slip-casting methods.

The slip cast part includes free silicon contained therein and a protective layer on the surface which protects the silicon from being attacked by plasma in the interior space of the chamber.

The slip cast part reduces particle contamination and reduces process drift in plasma processes such as plasma etching of dielectric materials such as silicon oxide.

Layers are made by depositing a liquid dispersion of the desired powdered material, which then slip-casts into the forming powder bed to make a new layer (34).

While my earlier designs were created with bone china using the slip casting technique, my current working method requires high technical skills and barely needs any artificial tools.