The present invention relates to novel neutral layer compositions and methods for using the neutral layer compositions for aligning microdomains of directed self- assembling block copolymers (BCP).
The etch mask comprises a pattern-defining block copolymer layer, and can optionally also comprise a wetting layer and a neutral layer.
The actuation layer includes a stress layer and a neutral layer that is constructed of materials and with a structure such that it stores torsional energy upon being constructed.
A neutral plane (Fd) of the overall diaphragm including the piezoelectric element is located within the neutral layer (22b) of the piezoelectric element, so that the piezoelectric element (22) is effectively deformed.
Transformative principle of providing coverage, which contain substances that convert already appeared in the chemical corrosion of the neutral layer.
Requêtes fréquentes français :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k,
Requêtes fréquentes anglais :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k,
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