The plasma generator generates and discharges, towards the object, ions in a plasma state for cleaning the surface of the object to be cleaned, and thus is provided with an outlet for discharging the ions in a plasma state.

The plasma antenna element may include one or more RF-conductive plasma devices that are selectively ionized to a plasma state under control of the controller.

It is understood that 99.999% of the universe is in a state of plasma.

More than 99.9% of the matter in the universe is in a plasma state.

The plasma state of a particle mixture is often described as the fourth state of matter.

The first plasma condition transitions to a second plasma condition.

The system may include an impedance ad]ustor e.g. integrated in the plasma applicator arranged to set a plasma strike condition and plasma sustain condition.

A first plasma condition is established for performing a first plasma doping step.

Abstract: Plasma is considered to be the fourth state of matter.

The plasma generator generates and discharges, towards the object, ions in a plasma state for cleaning the surface of the object to be cleaned, and thus is provided with an outlet for discharging the ions in a plasma state.

The plasma antenna element may include one or more RF-conductive plasma devices that are selectively ionized to a plasma state under control of the controller.

The Plexr uses the fourth state of matter: Plasma IL.

Plasma pen devices utilize the fourth state of matter, which is plasma.

The Plasma treatment uses the fourth state of matter – plasma.

The PLEXR device uses the fourth state of matter, known as PLASMA.