The rinse phase is composed of a fresh- water rinse phase and a steam rinse phase.

The cleaning step involves rinsing with water.

This is followed by a water rinse and drying.

Tap water rinse, de-ionized water rinse, de-smut, seal and bake procedures can also be performed on the metal part.

Provided is a method for washing polycrystalline silicon comprising an acid rinsing step in which an acidic solution is used and a water rinsing step in which purified water is used after the acid rinsing.

This is followed by a water rinse and drying by heating.

The electrical conductivity (C) of the purified water in the water rinsing tank is measured and the water rinsing step is judged to be completed on the basis of the measured electric conductivity (C).

During the fresh-water rinse phase, a rinse liquid is sprayed into the treatment chamber (2).

After cleaning and dissolution, water rinsing is carried out.

Amine oxide adhering to the wear layer is removed by washing with water.

The water rinse step of the print development process is accomplished in an oscillating wash bath (14) wherein the water is continuously circulated over and between the prints being rinsed.

When the durable water-dispersible foam is no longer needed, it is simply rinsed away with water.

The microemulsion and solids phases can be separated by a suitable technique such as centrifugation; residual O/W microemulsion can be removed by an aqueous rinse.

This is followed by a water rinse and drying by heating.

after washing with cold water, further spraying with disinfectant must be applied