A reflection-type light-splitting grating and an interference photoetching system.
Such a developing method can improve the line width uniformity of a photoetching pattern obtained after developing.
A transmission-type light-splitting grating and an interference photoetching system.
The invention relates to microlithography, in particular to the writing of photomasks for computer displays, microelectronic devices, and precision photoetching.
MOVPE growth and photoetching are integrated into a unified sequence which is carried out without removing a workpiece from a MOVPE reactor.
original screen for photogravure or process engraving
Photogravure | 1917 | View of Bhalil - Mosque (Morocco)
Photogravure published in Camera Work, No 21, 1908
Photogravure published in Camera Work, No 18, 1907
Internal photogravure with possible assistance to the screen
Said polymers are used in compositions for photoengraving on metals.
In photoengraving operations, it is necessary to spread resins, particularly photosensitive resins.
The above-mentioned sum is subtracted from the amount of total energy required for the photoengraving method.
It was used to make photographic prints, was very successful and was sometimes called direct photoengraving.
An alloy, a photoengraving article, a photoengraved article, and a method of forming a photoengraved article.
Thus, a high-quality photomask for platemaking having high resolution is obtained at a low cost.
Cameras for preparing printing plates or cylinders
Cameras for preparing printing plates or cylinders
The photolithography mask is derived such that substrate features are corrected to compensate for photolithography patterning system aberrations.
The shot boundary line in the second photo etching is spaced apart from the shot boundary light in the first photo etching.
The mask derivation process is applicable to either a metal interconnect photolithography mask or a polysilicon interconnect photolithography mask.
The method prevents deviation from being generated after an expected photoetch pattern is used to form a photoetch pattern on the surface of a silicon wafer.
A photolithography mask derivation process is provided for improving the overall planarity of interlevel dielectric deposited upon conductors formed by the derived photolithography mask.
The metal layers are structured using photomask techniques.
A photo-etching process may be used to fabricate the filament (18).
Test features contained on a photomask can be printed in a photoresist located on an upper surface of a semiconductor substrate by a photolithography patterning system.
The roughness of the surface results from photo-etching a screen with acid.
Blind Woman, New York, photograph by Paul Strand, 1916.
Some of the long circuits may be made using a single photoimaging mask.
In this part, I am going to talk a bit about photography.
A computer network for generating instructions for photomask manufacturing equipment, based on photomask specification data input by a customer.
Requêtes fréquentes français :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k,
Requêtes fréquentes anglais :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k,
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