A powder composition of ceric oxide and a stabilizing non-noble metal oxide, such as zirconium oxide, mixed at the atomic level in complete solid solution.
The catalysts nickel and/or copper on a ceria/zirconia support, where the support is prepared using a surfactant templating method.
The ceria, second metal oxide and optional activated alumina may be mixed together or provided as discrete layers.
B is preferably cerium dioxide or a cerium-zirconium mixed oxide having a Ce/Zr ratio of 5/95 to 95/5.
A catalyst composition has a washcoat coated onto a monolithic carrier, the washcoat including a catalytic material having rhodium and a base metal oxide promoter dispersed on a ceria-promoted zirconia support, e.g., a co-formed ceria-zirconia support.
A palladium three-way catalyst is supported on a unique ceria-lanthana-alumina support where the alumina content is lower than previously believed necessary to maintain catalyst activity.
The bottom layer comprises am oxygen storage component such as ceria supported on a refractory metal oxide such as gamma-alumina.
A ceramic optical fiber ferrule (12) is constructed from CaTiO3 (calcium titanate) or CeO2-ZrO2 (ceria-zirconia).
A polishing slurry, useful in optical or CMP applications, comprises a ceria with a BET surface area of at least 10 m2/gm.
The first protective layer comprises cerium oxide and/or cerium hydrate and/or cerium hydroxide, the secodn protective layer is made, essentailly, preferably completely of SiO2.
The palladium oxide is supported on a metal oxide such as alumina, lanthanide metal oxide-modified alumina, ceria, titania or tantalum oxide.
This powder in turn can be mixed with another rare earth oxide such as cerium oxide to form a slurry which in turn is used to coat a solid monolithic carrier.
The support consists of oxides of ceria and titanium.
Preferably the ceria and lanthana constitute the major proportion of the support.
The polishing slurry comprises a silica abrasive and a ceria abrasive, wherein the silica abrasive content is less than 3 mass% and the ceria abrasive content is less than 1 mass%, based on the entire polishing slurry.
Requêtes fréquentes français :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k,
Requêtes fréquentes anglais :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k,
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