The second metal must be different than the first and third metals such as, for example, iron.
The substrate can include a metal or metal alloy, and the thin film can include metal oxides, metal nitrides, metal carbides, or pure metals.
The busbar comprises a second metal and a third metal different from the first and second metals.
One of the layers comprises one or more metals, which are a paramagnetic metal, a ferromagnetic metal, or a superparamagnetic metal.
A metal barrier is interposed between the metals to prevent metal diffusion from one metal to an adjoining portion of another metal.
The metal salt may be selected from metal nitrate, metal sulfate, metal phosphate, metal acetate, metal carbonate, metal hydroxide, metal ammonium carbonate, and metal hydroxycarbonate.
The metal salt may be selected from metal nitrate, metal sulfate, metal phosphate, metal acetate, metal carbonate, metal hydroxide, metal ammonium carbonate, and metal hydroxycarbonate.
The second metal is a different metal to the first metal.
The metal(s) can be an alkali metal, an alkaline earth metal, a transition metal, and/or a main group metal.
Such metal- aluminum films can include metal aluminum carbide, metal aluminum nitride and metal aluminum carbonitride films.
It is preferable that the recording layer includes a squarylium metal chelate compound having a bivalent metal as its central metal and a squarylium metal chelate compound having a metal other than a bivalent metal as its central metal.
The second metal is different than the first metal, and the metalloid, the first metal, and the second metal account for at least 70 atomic % of the amorphous thin metal protective layer.
M represents two hydrogen atoms, two metal atoms or metal oxides, or, one metal atom or metal oxide.] FORMULA: AA General formula (1) BB General formula (2)
The weld metal is 12%CrNiMoCoV.
The metal can be a transition metal.
The anolyte contains the alkali metal levulinate, the alkali metal valerate, the alkali metal 5-hydroxy pentanoate, or the alkali metal 5-alkoxy pentanoate.
The brazing filler used in the process comprises a noble metal and a second metal.
The reactive metal oxidizes to a metal oxide, forming a hydrogen gas and the metal oxide can then be reduced back to the metal for further production of hydrogen without substantial movement of the metal or metal oxide to a second reactor.
An energized composite metal to metal seal.
Said base metal or base metal alloy, alloyed with at least one melting point depressant metal is mixed with at least one additive metal or additive metal alloy.
The preferred metal compound is a metal carboxylate.
The first metal is softer than the second metal.
The metal oxide or metal oxide precursor is capable of forming a hydrolizable metal carbide.
The top electrode comprises the same metal as the metal in the metal-insulator-transition material.
Preferred countehons include one or more alkali metal, transition metal, or alkaline earth metal cations.
lack of fusion between parent metal and deposited metal
The metal can be Mg, or other bioabsorbable metal.
M2 comprises an alkali metal or alkaline earth metal.
The subsequent metal to metal contact produces a phenomenon called scuffing.
In the metal cluster carrying metal oxide support of the invention, the cluster (6a) of the first metal is held by the oxide (8) of the second metal present on the metal oxide support (9).
Requêtes fréquentes français :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k,
Requêtes fréquentes anglais :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k,
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