That was Joe, which was their real thermonuclear device.

A light signal is communicated to the front surface of the wafer and the reflected light signal is captured by a metrology instrument.

A portable metrological instrument for measuring surface finish parameters has a main housing (1) which sits on a workbench (5).

A combination metrology tool is disclosed which is capable of obtaining both thermal wave and optical spectroscopy measurements on a semiconductor wafer.

A wafer-cleaning module is disclosed for removing contaminants frrm a semiconductor wafer prior to measurement in a metrology tool.

There is described a metrological instrument for measuring a characteristic of a surface of a workpiece, the instrument comprising a measurement unit and a user-interface unit separate from the measurement unit.

Multifunction gauge for measuring length, angles, surface perpendicularity or drawing of circles containing at least one rule (1).

The present invention is generally directed to a method and a structure for calibrating a scatterometry-based metrology tool (74) used to measure dimensions of features on a semiconductor device.

The growing need for control reports, especially for shapes with progressive radii, necessitated the purchase of a higher-performance, highprecision metrological instrument.

A stylus support assembly for a gauge for a metrological instrument has a main gauge body (1) and a mounting block (2) for supporting a stylus (3).

The metrology instrument communicates the intensity of the reflected light to a control system.

That was Joe, which was their real thermonuclear device.

slow change of a metrological characteristic of a measuring instrument.

Slow change of a metrological characteristic of a measurement instrument.

methods of measurement and metrological control