lodging the temporary storage declaration referred to in Article 145
The UAV is stored in a magazine and moved from the magazine during a launch operation and to the magazine during a recovery operation.
holder of a concession for an approved depot
holder of a concession for an approved depot
distribution depot/depot for the distribution of goods
The surface of the material depot is larger than the enveloping end of the material depot.
The selective deposition is performed by electroplating or electroless plating.
Various deposition techniques are employed including chemical vapor deposition, pulsed laser deposition and atomic layer deposition.
The deposition is facilitated by surface activation prior to deposition.
Wet chemical processing includes electroplating, electroless reductive plating, electroless displacement plating, chemical bath deposition and sol-gel deposition.
deposit facility shall mean the deposit facility organised by the Eurosystem.
every filing that is equivalent to a regular national filing
The deposition of the nanotubes on the capillary is an electro-assisted deposition.
Vapor depositions sources, systems, and related deposition methods.
The deposition is can include atomic layer deposition, chemical vapor deposition, MOCVD, molecular beam epitaxy, evaporation, sputtering, or pulsed-laser deposition.
A first deposition state is monitored, during the second deposition by making a first plurality of measurements of a first deposition state.
The deposition material supply unit (500) supplies a constant amount of deposition material to the deposition material evaporating unit (300) for every deposition process.
date of submission of a fare
Operator holding accounts and person holding accounts
A feed device (2) ensures that a separator liquid can be fed to the separator surface of said separator electrode (3).
The method of providing the electroless-deposited plating includes preheating a Pd electroless plating solution to near a plating temperature substantially greater than room temperature, e.g. 60 °C, prior to plating.
Deposition of the second metallization is de-coupled from deposition of the first metallization.
Such a deposition can provide a high deposition rate deposition of a layer of perovskite.
The present invention relates to vacuum depositions systems and related deposition methods.
A film layer is deposited using a cyclical deposition process.
An atomic layer deposition system is described that includes a deposition chamber.
The invention relates to the deposition of metal oxide coatings via combustion deposition.
The methods reduce reactions with the seasoned walls during deposition processes, resulting in improved deposition rate, improved deposition uniformity and reduced defectivity during subsequent deposition.
Rule 23 — Tabling of amendments
Then, the electrodeposition chamber (31) is filled with an electrodeposition coating solution (32), and electrodeposition coating is performed.
A hybrid deposition process of CVD and ALD, called NanoLayer Deposition ('NLD') is provided.
deposit facility rate means the interest rate applied to the deposit facility
A feeding device (80), by which deposition liquid can be fed to the upper region of each deposition surface, is assigned to each deposition electrode (25) of the deposition unit (14).
Requêtes fréquentes français :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k,
Requêtes fréquentes anglais :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k,
Traduction Translation Traducción Übersetzung Tradução Traduzione Traducere Vertaling Tłumaczenie Mετάφραση Oversættelse Översättning Käännös Aistriúchán Traduzzjoni Prevajanje Vertimas Tõlge Preklad Fordítás Tulkojumi Превод Překlad Prijevod 翻訳 번역 翻译 Перевод