An analyzer crystal has a thickness selected such that a mechanical strain on a side of the first monochromator crystal is the same as a mechanical strain on the analyzer crystal.

The second monochromator crystal has a thickness selected such that a mechanical strain on a side of the first monochromator crystal is the same as a mechanical strain on the second monochromator crystal.

the effect of an applied external force (mechanical strain)

In the first period there is a mechanical, in the second a moral constraint.

its electrodes when subjected to a mechanical force.

The aim of the invention is to protect the measuring device against mechanical stresses.

This is equivalent to the additional uncertainty of the mechanical stress.

The via is configured to alter the conductive path in response to mechanical stress caused by the stress inducing structure.

The application of mechanical stress breaks the particle agglomerates apart.

An opto-mechanical device comprises an optically responsive actuating member in which a mechanical strain occurs in response to changes in its illumination.

The transducer film generates a first signal in response to a mechanical stress applied thereto.

Apparent viscosity of a paint when subject to external mechanical stress.

The invention solves the task of providing a method and device which ensure that the wafer material is not subjected to mechanical stress.

The sample swab is also capable of withstanding repeated high heat treatment and mechanical stress.

The application of mechanical stress breaks the particle agglomerates apart.