The target assembly includes a target vessel with a target chamber adapted to receive a target material.
The target member is fixed relative to the target such that the target member points at the target.
The target surface has a first target surface area and a second target surface area.
The target assembly includes a target that has a concave shaped target.
A target device comprising a target and a supporting construction (1) having a target area (4) which contains the target.
The target server is queried to obtain a target list of objects at the target server.
Each source pixel in the source image is assigned none, one or several target pixels in the target image (T1).
The target register is to contain the address of the target that is loaded by the target definition.
The target system may be either a target hardware node (71) or an emulated target node (72).
The power supply supplies power to the first and the second targets such that when the first target sputters target material, the second target becomes anodic and when the second target sputters target material, the first target becomes anodic.
The destination operand identifies the destination vector register.
The target structure has the target for sputtering, and the backing plate, which has the target fixed thereon and cools the target.
A sputter transport device (100) comprises a sealed chamber (102), a negatively-biased target cathode holder (106) disposed in the chamber, and a substrate holder (130) disposed in the chamber (102) and spaced at a distance from the target cathode (104).
A pure carbon target, especially a graphite target, is used as a target and is biased by a negative direct-current voltage.
The target action rate may include a target breathing rate.
The second target torque is less than the first target torque.
The target face exists only as neutral (target face).
The invention relates to a target arrangement (26-32) for optically aligning an axle, comprising a target and a target maintaining element provided with a target receiving element on which the target is placed.
A target sensor (30) receives the reflected target and provides a target signal (32) indicative of the reflected target beam.
The device further includes a target designator for designating the target location and a target detector for detecting a position of the target location.
The obtained target data for the simulated target are compared to the expected target data for testing the function.
The invention relates to an arc source comprising a target (1), a front face (2) of the target for the vacuum evaporation of the target material, a rear face comprising a cooling plate (4), a central target region (Z), and a target edge.
The entry addition target determination block selects an entry addition target from the entry addition target candidate.
The sputter target comprises a target material and a magnet array located at the interior of the target material.
The target vessel has a target vessel wall defining a target lumen and has an opening in the target vessel wall.
Requêtes fréquentes français :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k,
Requêtes fréquentes anglais :1-200, -1k, -2k, -3k, -4k, -5k, -7k, -10k, -20k, -40k, -100k, -200k, -500k, -1000k,
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